Diener femto, Руководство по эксплуатации, Страница: 110 / 156

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10.27 OES – Optic Emission Spectrometer
• Supervising of plasma processes for quality assurance.
• Detection of plasma process endpoint.
• OES only in combination with PC – controlled machine.
The optic emission spectroscopy offers a possibility for online process supervising of low
pressure plasma processes.
For the process supervising the optic emission of plasma will be recorded and spectral
analysed.
The radiation that comes from plasma is characteristic for the procedures which happen during
a plasma process.
That’s the way online quality assurance, appropriate and also a control of plasma processes for
the treatment of parts can be realized.
For instance it is possible to detect, if and at which moment the treated parts get an adequate
plasma cleaning (detection of process endpoint). The endpoint detection is on many etch – and
ashing – processes applicable.
fig.: Picture of emission spectra of low pressure plasma for process supervising by OES.
fig.: Screenshot of process supervising by optic emission spectroscopy (OES).