DESCRIPTION
2.Description
2.1 Diffusion
system
The Furnace is designed to perform Diffusion/Atmospheric and Low Pressure Chemical
Vapor Deposition (LPCVD) processing on wafers from 75 mm up to 300 mm, and may be
installed in a cleanroom environment.
The furnace is housed in a utilized cabinet of heavy gauge metal construction with a Clean
Room Compatible Polyurethane finish. It contains max. 4 heating elements. Within the
furnace the heating elements are numbered from 1 to 4, starting with tube number 1 at the
top. The heat exchanger on the top of the furnace cools the exhausted air (a water-cooled
mantle for each tube is available as an option). Three phase power transformers are used to
maintain a constant temperature with a minimum of disturbance on the mainpower
distribution system.
The integrated modular construction provides discrete compartments for control equipment.
All electrical wiring, including the basic units of the temperature controller and electrical
components are housed in the base of the furnace.
The diffusion system may have a right or left handed orientation to suit the customers needs
(furnace on the right when standing in front of the loadstation means a right-handed system).
Major components of the diffusion system are:
•
Load
Station
•
Furnace System
•
Cross flow box (Horizontal or Vertical Flow Loadstation)
•
Gas
Cabinet
•
Control
system
On the next page an outline drawing of a Furnace System, model TS6804 is shown:
F
URNACE
R
EFERENCE
M
ANUAL
2-1
