Specification
PlasmaQuant MS product family
132
15
Specification
15.1
Technical data
15.1.1
ICP-MS data
Type of sample
Liquid
Pump
Four-channel variable-speed peristaltic pump (max. speed 100 rpm)
Type of nebulizer
Micromist concentric nebulizer (0.4 mL/min), optional PFA nebulizer
(0.1 mL/min) for semiconductor or geochemical type applications
Spray chamber
Scott type, double pass spray chamber, Peltier-cooled
Transfer tube
Connection between Spray chamber and torch, optional gas port for
sheath gas
Torch
Standard one-piece torch with 2.4 mm injector, optional semi-
demountable torch with platinum or sapphire injector, torch with 1.5
mm injector for organic samples
Plasma generation
Solid-state RF generator (300 V RMS, 27 MHz), water-cooled
induction coil with three windings, virtually center grounded. No
plasma shield needed.
constant power delivery from 0.3 to 1.6 kW
Nitrox option: integrated MFC gas control for online addition of
nitrogen and oxygen to the plasma
Interface
water-cooled interface assembly with sampler and skimmer cone
standard nickel cones, platinum tipped cones for use with corrosive
samples
Interference
management
iCRC (integrated Collision Reaction Cell)
Introduction of gas (He or H
2
) into the plasma interface, elimination
of interfering ions like ArO
+
by reactions and collisions
Vacuum system
Three chamber vacuum system, differentially pumped with
1 fore-line roughing pump and
2 integrated turbomolecular pumps
first chamber:
interface with sampler and skimmer cone, pressure 5 mbar
the chamber can easily be brought to atmospheric pressure for
maintenance after automatic closure of the gate valve
second chamber:
ion optics, pressure 10
-4
mbar
third chamber:
mass analyzer and detector, pressure 7 x 10
-5
mbar
Fore-line roughing
pump
PlasmaQuant MS (Q): model SV40BI
PlasmaQuant MS Elite (S): model XDS46i (oil-free)
vacuum line up to 12 m for remote location
Sample introduction
system
Plasma generation,
Interface and
Interferences
management
Vacuum system