MAGNETRON SPUTTERING
Observations of the phenomenon we now call sputtering, go back over one hundred years to early
experiments which introduced electricity into a reduced pressure atmosphere. L. Holland de-
scribes these beginnings in his book Vacuum Deposition of Thin Films.
“When an electrical discharge is passed between electrodes at a low gas pressure, the cathode
electrode is slowly disintegrated under the bombardment of the ionized gas molecules. This phe-
nomenon is termed cathodic sputtering. The disintegrated material leaves the electrode surface
either as free atoms or in chemical combination with the residual gas molecules. Some of the lib-
erated atoms are condensed on surfaces surrounding the cathode while the remainder are re-
turned to the cathode by collision with gas molecules.”
The ensuing process might be compared to a fine sand blasting in which the momentum of the
bombarding particles is more important than their charge. The inert gas argon was chosen, to act
as the sputtering medium, because it is a heavy rare gas and is plentiful. It also has a low ioniza-
tion potential. The inert nature of argon inhibits compounds from being formed at the target sur-
face.
Once sputtered, the target atoms travel until they reach a nearby surface most notably, the sub-
strate. The deposited layer forms or grows on the substrate structure, influenced by such things as
material, temperature and gas structure.
When the ions strike the target, their primary electrical charge is neutralized (gain back the lost
electron) and they return to the process as atoms. Thus, direct current sources generally prevail
as the electrical energy source.
Issued
September 11, 2008
5
Содержание MAK 1.3 inch
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Страница 52: ...1 Simplicity in Sputtering INTRODUCING Planar Magnetron Sputtering Source The MAK...
Страница 53: ...2 Simplicity in Sputtering Target Installation on the MAK Target Keeper Cathode Magnets...
Страница 55: ...4 Simplicity in Sputtering MAK without target installed Target Keeper Cathode Adjustable Anode...
Страница 56: ...5 Simplicity in Sputtering MAK with target installed Target mounted with magnetic keeper Anode retracted...