Precautions to assure the proper operation of your MAK Source
CAUTION
•
Water
MUST
be flowing thru the MAK while sputtering. Please see O&M manual for flow
requirements.
If MAK has been operated without water ---
DO NOT
turn the water on --- allow
the MAK to cool down before turning water on.
• Target paste [supplied with MAK]
MUST
be used. This provides a thermal layer between
the target and cathode [Copper block]. It is required to protect against uneven or irregular
surfaces of the target and / or cathode.
CAUTION
Failure to use target paste can damage the MAK
. A VERY SMALL AMOUNT
MUST
BE APPLIED -- A GLOVED FINGER USED TO SPREAD EVENLY OVER
THE CATHODE BLOCK. The block should be clearly visible --- thru a thin gray
film.
NOTE: A substitute paste such as thin [0.005”] Indium foil can also be used.
•
Ceramic or Oxide targets ---
MUST
--- be bonded to a copper backing plate that con-
tains a keeper.
•
A keeper
MUST
be used for all targets --- including magnetic. The keeper is used for
centering the target and maintaining a continuous magnetic path.
•
MAK Sputter Sources should be
CLEANED
on a routine basis. This is easily accom-
plished during target change.
1. With target removed, clean entire cathode assembly --- removing any foreign material
present. Cleaning of both inside and outside of the block is suggested.
2. Clean the anode shield.
Issued
September 11, 2008
2
Содержание MAK 1.3 inch
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Страница 52: ...1 Simplicity in Sputtering INTRODUCING Planar Magnetron Sputtering Source The MAK...
Страница 53: ...2 Simplicity in Sputtering Target Installation on the MAK Target Keeper Cathode Magnets...
Страница 55: ...4 Simplicity in Sputtering MAK without target installed Target Keeper Cathode Adjustable Anode...
Страница 56: ...5 Simplicity in Sputtering MAK with target installed Target mounted with magnetic keeper Anode retracted...