Inficon Transpector SPS, Руководство по эксплуатации

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Transpector SPS Operating Manual
5.3.1.7 Copper MOCVD
Table 5-7 lists some of the materials of interest and the masses for monitoring them
for the deposition of copper using Cu
I
(hfac)(tmvs). Oxygen and water vapor are
unwanted contaminants.
Table 5-6 Tungsten CVD materials of interest
Chemical Type Monitoring Mass
WF
6
reagent 279
H
2
reagent 2
SiH
4
reagent 30, 31, 32
Ar reagent 40
N
2
reagent 28
(interference from SiH4)
HF product 20 (at 35 eV)
O
2
contaminant 32
(interference from SiH4)
H
2
O contaminant 18 (at 35 eV)
WOF
4
by-product 257
Table 5-7 Copper MOCVD materials of interest
Chemical Types Monitoring Mass
CuI(hfac)(tmvs) reagent 201, 63
H
2
reagent 2
Ar reagent 40
tmvs product 100, 85
H(hfac) product 139
O
2
contaminant 32
H
2
O contaminant 18
(if Ar present, use 35 eV)