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Sion Operating Manual
1.13.1.2 Endpoint Detection
The Sion provides an extremely sensitive, reliable and repeatable endpoint method
for both etch processes and CVD chamber clean processes. Using RF technology,
the Sion directly measures the chamber impedance that directly correlates to the
chamber condition; which can eliminate frequent over-etch and under-etch
processing conditions.
1.13.2 Example of Use
is an example of a chamber clean endpoint signal from a 200 mm
Producer tool. The clean endpoint signal is visible from around 168 seconds using
the voltage data from the Sion detector.
Figure 1-34 Chamber Clean Endpoint Signal
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