4 Design and function
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Instructions for use
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MERGITE!
4
Design and function
4.1 Description of the functions
Number Description
Substrate field on the slide
Directed liquid flow (wash buffer)
Slide
Wash basin washing column
The MERGITE! washing technology allows for simultaneous and self-
contained washing of up to 50 substrate fields on a Titerplane slide.
For that purpose, the wash buffer liquid flow is divided in up to 50
channels, conducted into the wash basin via the washing columns
and directed onto the substrate fields of the slide. Every substrate
field is positioned above one washing column that provides for a
defined wash buffer liquid flow over the substrate field. The
standardized washing programs ensure that the different substrates
are washed each according to its requirements for washing intensity
and washing time. After washing, an aspiration process takes place
and removes remaining wash buffer from the substrate fields. After
that, the slides can be processed directly (conjugate incubation or
mounting) without further manual drying.
Fig. 4 Schematic representation of the washing process
