Document No.: 1P0446-1 Rev. B, April 7, 2014
5
1.2
Standard Equipment
CHAMBER
A special grade of 6061-T6 Aerospace grade of aluminum is used for the chamber and chamber door.
The aluminum chamber has been anodized with a proprietary process that improves the durability of
the chamber and improves the reliability of plasma or RIE processing. This anodized process is
proprietary and the thickness is closely monitored and measured to ensure repeatable plasma
processing. This is the same anodization procedure used in million dollar plus production plasma
systems used in the manufacture of semiconductors.
Incoming process gas is feed into the chamber by the port on the top left of the chamber (when
viewed from the front of the system). The screened outlet in the bottom right leads to the vacuum
valve and thus to the vacuum pump.
SAMPLE HOLDER
A sample holder is provided
—
the top shelf is for "Direct Plasma" and the bottom (middle) shelf is for
"RIE".
Figure 1-1
Sample holder
The RF feed through rails design, on the inside-back of the chamber, provides RF and ground to the
sample holder by way of two small rail clamps. The sample holder is inserted into the chamber and
makes contact with the RF connection in the back center of the chamber. The ground is provided by a
ground rail connection on the back of the chamber. As you face the chamber, the rail on the left is
the ground, and the rail on the right is the RF connection.
The sample holder should always be used and the operator should ensure that the sample holder is
pushed all the way in
—
making contact with the RF FEEDTHROUGH and ground lead.