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HEIDELBERG MLA150, User Manual

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HEIDELBERG MLA150 User Manual Download Page 73

 

MLA150 

7 System Utilities and Tools  

 

 
 

User Guide

 

 

67 

7.3.2 UNSATISFYING EXPOSURE RESULTS 

Sometimes exposure results can be unsatisfying for the needs of distinctive 
applications. The MLA150 offers a way of optimizing the exposure outcomes. It is 
possible to adjust the Defoc value or the Dose value. The following section gives details 
about how to work with these two values in order to improve exposure results.  

The Exposure Wizard offers a series exposure mode (6.8.3 Series Exposure 
Procedure). This utility can be used to optimize exposure results by adjusting the 
defocus value (Defoc) and/or the energy value (Dose). In order to find the best ratio 
between these two parameters a series of exposures with different values can be 
executed.  

 

For more information see the relevant chapter on series exposures.  

 

 

Summary of Contents for MLA150

Page 1: ...User Guide MLA150 Maskless Aligner...

Page 2: ...MLA150 ii User Guide Doc No DWL HI 062 Revision 1 July 2016 Copyright 2016 by Heidelberg Instruments...

Page 3: ...ded Use and Limitations 5 2 2 Conventions 6 2 3 Laser Safety 6 2 4 Electrical Safety 8 2 5 Other Risks during Operation 9 2 6 Interlock 9 2 7 Labels 10 3 System Description 13 3 1 Lithography Main Uni...

Page 4: ...3 1 Standard First Exposure 38 6 3 2 Standard Alignment 39 6 3 3 Series 40 6 4 Convert Design 41 6 5 Load Substrate 43 6 6 Draw Structures 46 6 6 1 Draw Image 47 6 6 2 Draw Line or Polygon 48 6 6 3 Ex...

Page 5: ...Results 66 7 3 1 Unsatisfying Alignment Measurements 66 7 3 2 Unsatisfying Exposure Results 67 7 4 Back Side Alignment 68 7 4 1 Overview of BSA Marker Zones 68 7 4 2 BSA Exposure Preparation 70 8 Ope...

Page 6: ...unction 21 Figure 8 E rack components 22 Figure 9 Orientation of stage and design 23 Figure 10 Machine related design rotation 23 Figure 11 Rotation of coordinate system on chuck 24 Figure 12 Location...

Page 7: ...the system The guide assists the user in performing the exposure procedure beginning at system startup and ending with the exposure procedure itself The subchapters in 6 Job Setup build a sequence of...

Page 8: ...1 3430 0 Fax 49 6221 3430 30 Email service_europa himt de Japan Korea Heidelberg Instruments Service Japan Germany Center for Industry Trade 1 18 2 Hakusan Midori ku Yokohama 226 0006 Japan Phone 81 4...

Page 9: ...cklist Checklist containing questions regarding the conditions of the costumer s installation site for the system Safety guide Describes necessary safety measures during move in installation as well a...

Page 10: ...MLA150 1 Introduction 4 User Guide...

Page 11: ...to read the documentation before using the product Every other purpose of use than that stated in this section is prohibited In case of damage by using the product outside this stated purpose no liabi...

Page 12: ...ser class as the interferometer laser in use which is laser class 2 Laser Type Wavelength nm Power mW Laser Class HeNe 632 6 2 The exposure laser beam is a powerful beam that is usually covered comple...

Page 13: ...ng adjustment work Do not put anything reflective or flammable into the beam path If the system has to be operated with open optics cover e g for trouble shooting Cordon off the area and place warning...

Page 14: ...allation Guide Ensure that both the voltage and frequency of a power source match the voltage and frequency stated on the equipment s electrical label Not all power cords have the same current ratings...

Page 15: ...rds by laser light or moving stage interlock circuits prevent stage movement and access to laser light as soon as the window opens A safety switch stops the stage holding it in position and closes the...

Page 16: ...MLA150 2 Safety 10 User Guide 2 7 Labels Flowbox front E Rack REAR DOOR FRONT DOOR...

Page 17: ...MLA150 2 Safety User Guide 11 Optics cover front cover side covers rear cover...

Page 18: ...MLA150 2 Safety 12 User Guide...

Page 19: ...ystem via our graphical user interface on the User PC This data is processed by the components located inside the electronics rack such as the stage controller which communicates with the stage and co...

Page 20: ...and clean air This is of importance because only such a stable environment guarantees constant exposure conditions which guarantees the smallest possible variation of exposure parameters The covers of...

Page 21: ...heating of the incoming air The air is cooled down by the water cooling unit and then reheated to 1 TEMPERATURE CONTROL UNIT 2 DISPLAY 3 SWITCH PANEL 4 CASTOR WHEEL 5 WINDOW 6 LIGHT 1 ACTUAL TEMPERATU...

Page 22: ...hut down the system and call one of Heidelberg Instruments service offices see 1 2 Contact CASTOR WHEELS The flow box stands on eight castor wheels that have locking brakes in order to provide a stabl...

Page 23: ...ty to the system It has been selected for its low thermal expansion coefficient The granite base plate is supported by air buffers that ensure effective vibration isolation and has threaded holes to a...

Page 24: ...hold down and kept it in place by vacuum suction The chuck features a vacuum suction hole in the center and four small vacuum slits through which the vacuum reaches the substrate Due to the viewing s...

Page 25: ...te side elements The optics plane contains the optical elements and all camera components The write head stands at the end of the optical path and is mounted to this plate with downward beam direction...

Page 26: ...arks are larger than the field of view of the High Res camera switching to the macro camera is recommended The overview camera is not appropriate for alignment Additionally it does not show the comple...

Page 27: ...aser interferometer is an optical device for measuring the stage position The machine achieves its required positioning precision with this important element WRITE HEAD The write head is mounted to th...

Page 28: ...ed into a machine file format the LIC format LIC stands for Laser Internal Code Only this special file format can be read by the MLA system 2 STC RACK The STC Rack is a system control unit consisting...

Page 29: ...ientation of structures already exposed on the substrate The coordinate system of the stage is oriented such that the y axis corresponds to a left right movement and the x axis to a backward forward m...

Page 30: ...re 11 For easier orientation on the chuck regarding the design coordinates the following figure gives an example of alignment crosses and their location on the substrate x y x y x y x y 90 clockwise x...

Page 31: ...steps of an exposure set up To start the wizard double click on the link icon 4 1 Overview Exposure Wizard The Exposure Wizard has its own window This window stays open throughout the entire configur...

Page 32: ...ter the entry of values Throughout this manual you find instructions like double click Design In this case you are instructed to double click the value field with the title Design not the word Design...

Page 33: ...xposure and unloading It is a graphical representation of the sequence of panels making up one exposure job As a kind of panel map it can be taken for orientation The green rectangle shows the options...

Page 34: ...of the design that is currently loaded Design Size mm shows the size of the design Dose mJ cm shows the exposure energy for the current job Height shows the height of the substrate on the cuck Layer...

Page 35: ...osure crosses for the next layer can be determined and exposed together with the First Exposure layer Align Cross Positions shows the positions of the alignment crosses taken from the template file Fo...

Page 36: ...coordinate of the current stage position A click on Refresh updates the fields to show the current position The Status list informs about the status of the system devices If there is a red cross inst...

Page 37: ...te The position of the camera is also displayed in order to see which part of the substrate is currently visible in the camera image Depending on the kind of substrate shape plate or wafer the menu of...

Page 38: ...entation and the size of the camera are scaled in relation to these measure lines To move the design to a certain position on the substrate use the Control Panel Alternatively drag the camera hold mou...

Page 39: ...r In case the system was switched off by using the EMERGENCY OFF button Release by turning it in the direction indicated on the button Otherwise the system power cannot be switched on Press the green...

Page 40: ...ker that is located on the front of the power distribution rack at the bottom of the electronics rack see 3 2 Electronics Rack Note In general the system should be powered down completely only if abso...

Page 41: ...rs build a sequence of actions that have to be executed one after the other To use the wizard efficiently follow the instructions given in this chapter The following figure is a panel map showing the...

Page 42: ...ect the job you would like to repeat The process data of the selected job is deleted and a new job is set up with the same settings but with a new job name number Start another new job after you have...

Page 43: ...bout the chosen substrate It offers a list of templates In case the required template is not available in the list it is possible to load a new substrate template only for authorized users For selecti...

Page 44: ...that is not in the list follow the instructions given in 6 4 Convert Design The following sections contain instructions on design loading Even though the loading procedures differ only slightly from e...

Page 45: ...for alignment crosses which are exposed on the layer To load this template double click into the value field titled Expose Crosses and select a bitmap template file from the list If the template size...

Page 46: ...ate and click Load The template file is now listed in the Align Crosses field Optional Double click into the value field titled Resist and select the appropriate resist type for your application The r...

Page 47: ...he next section 6 5 Load Substrate For converting a new design follow these instructions In the Layer frame Double click into the value field titled Design A page containing a list of designs opens At...

Page 48: ...sign format From the directory select the file to be converted into the LIC format If necessary change settings and or use the viewer application see related document Conversion Job Manager for more d...

Page 49: ...justment aid inside ADJUSTMENT AID The guide bar at the bottom of the adjustment aid is equipped with rest positions corresponding to the different wafer sizes that are possible to be loaded on the ch...

Page 50: ...tool s position to the substrate size Use a tweezer to grab the substrate and place the substrate on the chuck Note Check for correct loading and head position At the operator panel press the vacuum...

Page 51: ...ate selection The system searches for the center of the substrate and gives information about the progress via a message box If you wish to abort the Find Plate Center procedure click Stop in the mess...

Page 52: ...ctivate this option to use the shapes offered in the camera window rectangle ellipse circle or bitmap file Draw Line or Polygon Use this option to draw lines or polygones lines with more than two poin...

Page 53: ...rresponding icon You can also load an existing file by clicking Load and selecting the file from the corresponding folder usually C HIMT Designs Bitmaps To directly load a bitmap file click BMP locate...

Page 54: ...on of the created image work with the camera window is done Return to the wizard window and the Draw Mode panel in which the exposure process can be started see 6 8 4 Draw Mode Exposure Procedure 6 6...

Page 55: ...work with the camera window is done Return to the wizard window and the Draw Mode panel in which the exposure process can be started see 6 8 4 Draw Mode Exposure Procedure 6 6 3 EXPOSE CROSSES IN DRAW...

Page 56: ...System Back side alignment is supported by two cameras low and high resolution The overview camera is still active but provides only top side view on the substrate The Low Res camera is the default ca...

Page 57: ...era Control panel Top Surface Back Surface Field of view Field of view Low Res 640 m x 480 BS Low Res min 364 x 274 m High Res 190 m x 140 m BS High Res min 172 x 130 m Overview 20 mm x 20 mm Overview...

Page 58: ...d moves it to the center of the camera window Examine the positions and click Accept Position to confirm it The procedure moves on to the next alignment cross In the Pos field the rectangle turns into...

Page 59: ...procedure is possible by clicking Cancel Alternatively with Setup Job the alignment procedure gets cancelled and the Exposure Wizard moves back to the Setup Job panel Click Continue The design is now...

Page 60: ...URE PROCEDURE After having loaded the design and the substrate you are in the First Exposure panel Double check the design name and the wavelength If no default value is given set the Dose by entering...

Page 61: ...loaded the design and the substrate and having prepared the alignment crosses the substrate is ready to be exposed In the Alignment Exposure panel Double check the design name and the wavelength If n...

Page 62: ...previous layer Shearing mRad The system compensates small distortions such as a rectangle that appears more like a parallelogram Optional Activate Auto Unload The system executes the unloading proced...

Page 63: ...elds Use the spin button to select the number of fields to be exposed In the Dose Series table you set the parameters for the series with varying energy values In the Defoc Series table you set the pa...

Page 64: ...al fields represent the dose fields see below If the fields overlap the step size has to be changed to a higher value If the field arrangement exceeds the substrate surface size the number of fields h...

Page 65: ...panel to start the exposure In the Draw Mode panel Set the Dose value by entering the value into the text field Set the Defoc by selecting the value with the spin buttons range 10 to 10 The defoc all...

Page 66: ...posure modes in Draw Mode same location as in First Exposure Mode After the unloading procedure had finished the wizard directly leads you back to the Setup Job Panel where you can start a new job wit...

Page 67: ...able to light Close the window by pushing and releasing the button If required click OK in the Exposure Wizard to close the unloading dialog Resist coated substrates get useless when exposed to white...

Page 68: ...MLA150 6 Job Setup 62 User Guide...

Page 69: ...recommended to use the High Res camera as its high resolution is best for alignment procedures Top Surface Back Surface Field of view Field of view Low Res 640 m x 480 BS Low Res min 364 x 274 m High...

Page 70: ...ng the slider or by clicking into the value field and entering the speed manually Alternatively click into the slider field and use the arrow keys for setting the speed In step mode enter the step siz...

Page 71: ...th the wizard we provide a camera software that opens in an individual window The window is only for viewing purposes and is navigable by using the Control Panel see 7 1 Control Panel The example belo...

Page 72: ...e case click ResizeDetectionArea Inside the camera window a rectangle appears showing the new detection area To enlarge the detection area click the right bottom corner of the rectangle without releas...

Page 73: ...following section gives details about how to work with these two values in order to improve exposure results The Exposure Wizard offers a series exposure mode 6 8 3 Series Exposure Procedure This util...

Page 74: ...and used for alignment Each opening is 10 mm wide and 46 mm or 76 mm long The first edge is located 12 mm or 14 5 mm from the center of the chuck The BSA markers can be positioned anywhere in this are...

Page 75: ...MLA150 7 System Utilities and Tools User Guide 69 Figure 16 BSA marker zones overview...

Page 76: ...o all layers Step 2 After processing of side A position wafer on chuck with side B on top Remove the inlets of the required BSA holes in the chuck Define your default marker positions in the MLA150 me...

Page 77: ...an room conditions are within the limits given in the Technical Data section Make sure nothing is placed inside the system that obstructs stage movement ENVIRONMENTAL ADJUSTMENT Allow room humidity to...

Page 78: ...ems may have the following causes Poor developing chemicals Wrong developing speed Wrong resist type or thickness Focus or energy setting incorrect Out of date resist THE MLA150 STOPS ANYTIME DURING T...

Page 79: ...ftware This software enables the service engineer to enter the system via remote connection It might be possible that the service person asks for the system s access data Start TeamViewer QS by clicki...

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