Brooks Instrument GP200 Series, Installation & Operation Manual

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separate pressure transducers, the GP200 differential pressure
technology reduces measurement uncertainty for enhanced
accuracy, repeatability, and drift performance.
Lower Inlet Pressure Operation
Safer fab operation at lower inlet pressures is now achievable with
a P-MFC due to the GP200’s differential pressure sensor that is
specifically optimized for low differential pressure measurement.
Cross-Talk Insensitive
Maintains tight process control under dynamic process conditions-
the accuracy of the GP200 P-MFC will stay within ≤ ± 1% of S.P.
during extreme pressure supply disruptions up to 40 psi/sec.
Matched Transient Response
Ultra-fast, highly repeatable ascending and descending flow
stabilization time enables tighter process control in advanced high
cycle Deposition and Etch processes.
Downstream Valve Architecture
The GP200's downstream valve architecture ensures that accuracy
is independent of downstream pressure, enabling flow delivery into
pressures as high as 1200 Torr. The GP200's fast closing valve
addresses non-productive recipe wait times, or "tail effects", that
are seen in upstream MFC valve designs that require additional
time to bleed down their internal volume of gas.
Zero Leak-by Control Valve
100X improvement in valve shut-down addresses the long standing
“first wafer effect” where the accumulation of unmetered gas
(between the MFC control valve & downstream isolation valve)
contributes to non-uniformities and Critical Dimension (CD) defects
on the first wafer of a process.
High Flow Rate Capability
10 sccm to 50 slm F.S. N2 equivalent P-MFC supports all process
flow needs with just nine (9) standard bin configurations for
maximum flexibility.
Specifications for GP200 Series Devices
Section 1 Introduction
5