RF
POWER
SUPPLY
～
RFS-03D
～
2. GENERAL DESCRIPTION
3
２.
GENERAL DESCRIPTION
This section describes character, construction and specification about this product.
２.１.
INTRDUCTION
This system is designed to generate plasma in RF sputtering, plasma CVD, etching and other applications.
The RF power supply can supply the RF electric power of the maximum 300W to the RF load (generally, RF
electrode) with 13.56MHz by combining with the adjustment machine (matching box).
２.２.
CHARACTER
Features of this system include the following.
All solid-state type
Featuring small size and high reliability by quartz crystal oscillation.
Cooling water is not needed because of air cooling.
２.３.
COFIGURATION
This system consists of the following.
RF power supply main body
AC input cable JA01(3m)
D-sub connector for EXT.CONT(15pins/female)
Instruction manual(this book)
This device needs the matching box (adjustment machine).
Fig. 2.1 shows the system configuration.
The basic configuration includes the following.
RF power supply RFS-03D
Manual matching box MBX002M
RF output cable JA31
Control cable JA32
Fig 2.1 System configuration
RFS
-
03
D
MBX
002
M
AC IN
AC
100
V
JA
31
JA
32
JA
01
(
EXT
.
CONT
)
RF
OUT
CONTROL
