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Document No.: 1P0446-1 Rev. B, April 7, 2014
6
Figure 1-2
RF Feed through rails
NOTE:
The sample holder
must
be properly inserted into the chamber for the system to operate
correctly. The audible alarm will alarm if the sample holder is not inserted into the chamber, and the
system will not start.
RF GENERATOR
An internal 13.56 MHz RF power supply is installed as part of the system. The RF generator is a solid-
state crystal-controlled oscillator designed to provide up to 150 watts of continuous wave 13.56 MHz
power to the reaction chamber. One of the limited number of frequencies permitted by the Federal
Communications Commission (FCC) for plasma applications, 13.56 MHz is probably the overall best in
terms of plasma uniformity and speed.
Maximum power transfer from the power supply to the reaction chamber is accomplished by
matching the output impedance of the generator to the input impedance of the reaction chamber
.
AUTOMATIC TUNING
An auto tuning system is installed for the impedance matching network. The auto tuning adds
circuitry which continually monitors the forward-to-reverse power ratio during processing and
positions air capacitors for optimum power transfer to the CHAMBER.
The air capacitors in the tuning network are designed to rotate in a circular fashion without stopping
to reverse direction
—
this allows for very quick tuning in the IoN 3.
An audible alarm will sound if a high reflected power is detected when a process is initiated. If this
condition does not resolve itself within 25 seconds the process will abort.
GAS CONTROL FLOWMETER
Two flowmeters are provided to regulate the flow of gas into the chamber. The vacuum pressure of
the chamber is regulated by the flow of gas into the chamber. The more flow, the higher the
pressure.