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I
NSTRUCTION
M
ANUAL
3601 E. 34th St. Tucson, AZ 85713 USA Tel. +1 520-882-6598 Fax +1 520-882-6599 email: [email protected] Web: http://www.metallographic.com
Please read this instruction manual carefully and follow all installation, operating and safety guidelines.
NANO 2000T Polisher
7.3 Polishing Pads
Metal Mesh Cloth.
This is a wire mesh material useful
for coarse and intermediate lapping / polishing. The
texture of this wire allows for the abrasive to become
semi-fixed, thus offering the advantage of increased
stock removal, while minimizing damage.
POLYPAD
™
Polishing Pad.
This cloth is a synthetic
polyester polishing pad which has a similar action to a
nylon pad, except that it is much more durable. It is used
in the intermediate polishing steps.
TEXPAN Polishing Pad.
This is the most commonly
used polishing cloth material for the intermediate
polishing steps. TEXPAN™ Polishing pad is a low-
napped cloth.
Black CHEM
™
2 Polishing Pad.
This porometric
polymer pad has the consistency similar to a rubber type
of pad. Black CHEM™ 2 pad has a low nap but behaves
as an intermediate polishing pad with a performance
between low-napped and high-napped pads.
GOLDPAD Polishing Cloth.
This is a woven low-
napped polishing pad used mostly for intermediate
diamond polishing for ceramics and metals and polymers.
ATLANTIS Polishing Cloth.
This polishing pad is a
laminated polishing cloth having a resilient foam backing.
The foam backing allows the polishing to conform better
to the specimen surface.
MICROPAD
™
and MICROPAD
™
2 Polishing Cloth.
This is the most commonly used high-napped final
polishing cloth for metals and polymers. Its high nap
provides a very soft and gentle polishing action.
NAPPAD
™
Polishing Pad.
This is another high-napped
final polishing pad useful for most metals and polymers.
It has a higher nap than MICROPAD™, providing the
most gentle polishing action of all the cloths.
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