Safety
55 / 264
03/2015
2.4
Risks caused by the product
2.4.1 Risk caused by special location / ambient conditions
Risk caused by toxic and hazardous vapours, gases and substances (e. g. bacteria, viruses). If the backwater
lifting station is located in an inspection chamber, any necessary work must always be done by specialist staff
(see 2.2).
2.4.2 Risk of electric shock when plug has been screwed off
There is a risk of electric shock at the control unit (230V model type only) if one of the plugs for power supply
to the pumps has been dismantled. The union nut on the electric plug must be fitted so tightly that it cannot be
loosened without a tool (e.g. by children) (see 3.8).
2.4.3 Risk caused by hazardous atmosphere
There is a risk of a hazardous atmosphere occurring in the chamber system during work. Make sure the system
is well aerated and use safety equipment such as e.g. a multi-gas warning device if appropriate.
2.4.4 Health risks
The backwater lifting station pumps wastewater with sewage which can contain hazardous substances. Make
sure eyes, mouth or skin do not come into direct contact with the wastewater or parts of the system soiled
by it. In the case of direct contact, the part of the body affected must be washed thoroughly immediately and
disinfected if necessary. Wear personal protective equipment.
2.4.5 Risk caused by noise
Operation of the backwater lifting station can cause a high noise level. Wear appropriate protective equipment
if necessary and take sound-insulating measures.
2.4.6 Explosion hazard
The inside of the wastewater tank can be classified as a potentially explosive space (EN 12050). Biological
digestion processes can result in combustible gases (hydrogen sulphide, methane gas). Before opening the
wastewater tank (e.g. to dismantle the pump), make sure there is a sufficient exchange of air in the chamber
system.
When the wastewater tank is open, make sure there are no sources of ignition nearby (e.g. operation of
electrical devices without encapsulated motor, metalworking, smoking etc.).
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