R·I·T
Title: ASML Stepper
Semiconductor & Microsystems
Fabrication Laboratory
Revision: B Rev Date: 12/21/2010
Approved by:
/ / / /
Process Engineer Equipment Engineer
RIT SMFL
Page 1 of 11
1
SCOPE
The purpose of this document is to detail the use of the ASML PAS 5500 Stepper. All users are expected
to have read and understood this document. It is not a substitute for in-person training on the system and
is not sufficient to qualify a user on the system. Failure to follow guidelines in this document may result
in loss of privileges.
2
REFERENCE DOCUMENTS
Batch Control PAS 5500 Training Module
Reticle Design Manual
PAS 5500 User Guide
PAS 5500 Job Definition
PAS Global Alignment Strategies
PAS 5500 Steppers up to and including /300 Stepper Introduction
3
DEFINITIONS
n/a
4
TOOLS AND MATERIALS
4.1
General Description - The ASML PAS 5500/200 is a 5x reduction, i-line stepper set up for
exposure of 6 inch wafers using 6 inch reticles. The system has 350nm resolution with a
0.48-0.60 variable numerical aperture. The maximum field size on the wafer is 22x22mm.
Overlay capability is better than 50nm. All lithography levels for a particular design are
included in a single stepper job.
