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NANOSYSTEM

 FABRICATION FACILITY (NFF), HKUST 

Version 1.0

 

Page  1  of  14 

Standard Operating Manual 

___________________________________________________________ 

Branson IPC 3000 O

2

 Asher   

Содержание IPC 3000

Страница 1: ...NANOSYSTEM FABRICATION FACILITY NFF HKUST Version 1 0 Page 1 of 14 Standard Operating Manual ___________________________________________________________ Branson IPC 3000 O2 Asher ...

Страница 2: ...come a Qualified User 3 1 Emergency Responses and Communications 3 2 Training to Become a Qualified User 4 Operating Procedures 4 1 System Description 4 2 Safety Warnings 4 3 Operation Rules 4 4 Initial System Checks 4 5 Status Checks 4 6 Steps to operate the equipment 4 6 1 Load the Wafers or Specimens into the chamber 4 6 2 Select Recipe and Run the Process 4 6 3 Pump Down and Start the Process ...

Страница 3: ...Cleanroom Room 4162 Process Capabilities Fig 1 Branson IPC 3000 O2 Asher 2 Process Capabilities 2 1 Cleanliness Standard Branson IPC 3000 O2 Asher is an Non Standard equipment for Photo Resist etching 2 2 Recipes Two standard recipes are provided for processing photo resist stripping and plasma Touch Screen Panel RF Generator Mechnical Pump Chamber Door Chamber ...

Страница 4: ...erature at the end of ash o C 75 Power during ash W 150 O2 pressure Torr 1 3 Ash time minutes 1 Photoresist Stripping Striper RCP Ramp ambient N2 flow rate slpm 0 45 Temperature at the end of ramp o C 100 Power during ramp W 300 N2 pressure Torr 1 3 Process O2 flow rate slpm 0 45 Temperature at the end of ash o C 200 Power during ash W 300 O2 pressure Torr 1 3 Ash time minutes 20 NOTE Please consu...

Страница 5: ...Mr Wing Leong CHUNG 2358 7211 64406238 Deputy Safety Officer Mr Man Wai LEE 2358 7900 9621 7708 NFF EC Technician Mr Peter Yiu Cheong PUN 2358 7225 2358 7218 NFF Phase 2 Technician Mr Wilson Pui Keung YIP 2358 7894 3 2 Training to Become a Qualified User Please follow the procedure below to become a qualified user 1 Read the operation manual of Branson IPC 3000 O2 asher which can be found at NFF w...

Страница 6: ...e a low pressure low temperature gaseous plasma Ashing etching and polymer surface modification can be performed quickly and reproducibly It consists of a quartz process chamber main unit touch screen panel RF generator pressure gauge thermal couple and power supply O2 and N2 are provided for process and vent Fig2 Touch Screen Panel Fig3 RF Generator ...

Страница 7: ...NANOSYSTEM FABRICATION FACILITY NFF HKUST Version 1 0 Page 7 of 14 Fig4 Mechanical Pump Fig5 Main unit including chamber ...

Страница 8: ...h is isolated in a quartz tube see Fig 6 3 The system will be damaged if wrong recipe parameters are applied Make sure NFF staff knows in case of any change of recipe parameters 4 Machine case is hot during process Don t touch any surface to prevent burns 5 Do not operate this machine if you are pregnant since small amount of unpreventable RF power would escape from the machine 6 Mechanical pump o...

Страница 9: ...s still open 7 Except for main menu Process for Engineering menu and Diagnostics menu do not click into other menus such as Maintenance menu 8 Do not stop the process by an improper way during normal operation For example turn off the RF generator to stop the process during normal operation 9 Do not change the machine settings without permission of NFF staff 10 This equipment is only for purposes ...

Страница 10: ...hamber 1 Put the wafers or specimens into suitable quartz boats The quartz boats are located on top of the main unit 2 Make sure the chamber is vented 3 If the door is locked pull the knob and turn it in clockwise direction Unlock and open the chamber door 4 Use the metal fork to load the boats into the chamber 5 Put the boats in the center position of the chamber Don t damage the thermal couple w...

Страница 11: ...2 Wait 120 100 1 0 0 45 300 1 3 0 ON 3 Delay 30 100 1 0 45 0 0 1 3 0 OFF 4 Delay 300 200 1 0 45 0 300 1 3 0 ON 5 Finish 0 0 1 0 0 0 0 0 OFF Table1 Recipe parameters of Striper RCP Step No Step Function Time sec Temperature o C Steady Intn Factor Gas1 O2 SLPM Gas2 N2 SLPM RF Power W Vac Pressure Torr END Point Detect RF 1 Delay 70 25 1 0 0 45 0 1 3 0 OFF 2 Wait 140 70 1 0 0 45 300 1 3 0 ON 3 Delay ...

Страница 12: ...ROCESS to start the process 4 6 3 Pump down and start the process 1 Once click START PROCESS the chamber pump down automatically to reach its vacuum set point which is 0 01Torr A popup message shows Waiting for Vacuum Pump down see Fig 8 2 After pressure reached 0 01Torr process starts with real time process information showing on another page see Fig 9 Those process feedback values are presented ...

Страница 13: ... process check the process feedback values to make sure the values are close to the set values in recipe Otherwise report to NFF staff to check for the equipment Don t go away while machine is running and keep monitoring the process until completed 4 If the process needs to be aborted during running Click STOP NOT PURGE and ask NFF staff to vent the chamber to take out the wafers or specimens 5 Ot...

Страница 14: ... direction Open the chamber door and take out the quartz boats by metal fork Don t touch the quartz boats or chamber by hands because they might be still hot 2 Exit and go to the main page Click Diagnostics see fig 10 to stop venting and exit again to go back to the main page 3 Make sure the chamber and the working environment are clean after use Fig 10 Diagnostic menu ...

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