R·I·T
Title: ASML Stepper
Semiconductor & Microsystems
Fabrication Laboratory
Revision: B Rev Date: 12/21/2010
RIT SMFL
Page 7 of 11
6.4.8 Under Process Data you may adjust exposure energy, focus and tilt settings. The
minimum energy is 40mJ/cm
2
. Under Illumination Mode select either
conventional or annular. Numerical aperture and sigma may be specified. After
changing any of these values you must select the Apply button for the changes to
take effect.
6.4.9 The Clear button at the bottom of the screen will clear all of the entries and allow
you to start over.
6.4.10 The Run button will start the batch. Wafers will automatically load, align, expose
and unload.
6.5
Unloading Wafers
6.5.1
Lift the cover on the output cassette and remove the wafers. Do not remove a carrier
that is not fully raised.
6.5.2 Place the empty cassette back on the tool. All 4 stations should have a cassette.
6.6
Unloading Reticles
6.6.1 To remove the reticle box from the machine, under Main Menu, select Mat Hdl
from the top of the screen and then 3 – Exchange Reticle Box. Click the Unlock
button in the middle of the screen to unlock the reticle box.
6.6.2 Remove the box by lifting straight up 2 cm, tilting the front up and moving it away
from the stepper at a 45 degree angle. Always support the reticle box on the bottom
to prevent reticles from falling out.
6.6.3 Carefully open the reticle box. Unload the reticles. Never touch the surface of a
reticle. Close the reticle box and make sure it is secured before lifting.
6.6.4 Replace the reticle box on the stepper by lowering it straight down without tilting it.
The open side of the internal cassette should be towards the stepper. The reticle
box should be stored on the stepper when finished.
6.6.5 Exit back to the Main Menu.
