!
IMPORTANT: Use of this equipment with other than intended gases
may create potentially hazardous conditions. The process gas to be
purified must correspond with the part number specified on the label
attached to the purifier. Verify that purifier has the appropriate part
number for its intended gas service (see Table 2 below).
Pall Gaskleen
®
Bulk Purifiers improve and maintain the purity of
specific process gases or gas mixtures used in semiconductor
manufacturing and other purity-critical applications. Purifier
datasheets should be referenced for performance specifications.
Table 2:
Purification Material Designations (“xxxxP” in part number)
and Intended Process Gases
INP:
Helium (He)
Nitrogen (N
2
)
Neon (Ne)
Argon (Ar)
Krypton (Kr)
Xenon (Xe)
Tetrachlorosilane (SiCl
4
) *
SIP:
Hydrogen (H
2
)
Methane (CH
4
)
Ethene / Ethylene (C
2
H
4
)
Ethane (C
2
H
6
)
Propene / Propylene (C
3
H
6
)
Propane (C
3
H
8
)
Butane (C
4
H
10
)
Cyclopropane (
c
-C
3
H
6
)
Dimethyl Ether ((CH
3
)
2
O)
Carbon Monoxide (CO)
Silane (SiH
4
)
Disilane (Si
2
H
6
)
Methylsilane (SiH
3
CH
3
)
Trimethylsilane (SiH(CH
3
)
3
)
Carbonyl Sulfide (COS)
FCP:
Fluoromethane (CH
3
F)
Difluoromethane (CH
2
F
2
)
Trifluoromethane (CHF
3
)
Tetrafluoromethane (CF
4
)
Tetrafluoroethane (C
2
H
2
F
4
)
Pentafluoroethane (C
2
HF
5
)
Perfluoroethane (C
2
F
6
)
Heptafluoropropane (C
3
HF
7
)
Perfluoropropane (C
3
F
8
)
Perfluorocyclobutane (C
4
F
8
)
GEH4P:
Germane (GeH
4
)
SF6P:
Sulfur Hexafluoride (SF
6
)
NH3P:
Ammonia (NH
3
)
