BESTEM – D01R
【
Template
】
When
「
Template
」
tab is double clicked, a screen as on the right will be displayed.
1.
Position set parameter setting method
①
Position set method ---
Selects positioning method
during chip recognition.
②
Matching rate [
％
] --- Sets chip pattern matching
rate
（％）
.
③
Search size (W,H [pixel])
--- When Setting button is
clicked, search window will be displayed.
X, Y position is fixed at center of screen. With
Bigger, Smaller button, set the search range
during positioning matching and then click
Confirm button.
The color of display window before being
confirmed is blue.
④
“Mask region”([pixel])
---
Selects “Use, Not Use”. When
「
Use
」
is selected then Setting button is
clicked, “mask area” will be set.
Once the above setting is completed, after select the template type (Rectangle(Standard),
Rectangle(Artificial(W)), Rectangle(Artificial(B)), Hexagon(H), Hexagon(V)), please click Template
setting button. A template will be created. In continuance, click Model optimization button to optimize
the template model.
※
To adjust the clearance of the pattern, please adjust the
「
Template
」
tab
→「②
Contrast
」
parameter
in super user mode. For “contrast”, when adjust to lower value, low contrast edge clearance will be
produced. when adjust to higher value, high contrast edge clearance will be produced.
2.
“Position set tolerance” (X,Y) ---
Sets positioning allowable range during chip recognition. [Unit:
μ
m]
P
．
6
