Panasonic MCO-230AIC, Руководство по эксплуатации

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62
H
2
O
2
DECONTAMINATION
When the chamber is contaminated or when cleaning the chamber prior to starting a culture, it is possible
to perform H
2
O
2
decontamination.
H
2
O
2
decontamination function is workable under any of the following conditions. When the condition is not
fulfilled, H
2
O
2
decontamination can not be performed.
・ When an H
2
O
2
generator MCO-HP is installed in the MCO-230AICUVH.
・
When all H
2
O
2
generator MCO-HP, H
2
O
2
decon board MCO-170HB and electric lock MCO-170EL are
installed in the MCO-230AICUV.
・
When all UV system set MCO-170UVS, H
2
O
2
generator MCO-HP, H
2
O
2
decon board MCO-170HB and
electric lock MCO-170EL are installed in the MCO-230AIC.
WARNING
Use the reagent specified by our company for H
2
O
2
decontamination . Using a different H
2
O
2
solution
may cause explosion or damage to the incubator, or insufficient decontamination.
Do not use chemicals other than the H
2
O
2
reagent, such as alcohol. Doing so may result in damage to
the H
2
O
2
vapor generator.
WARNING
When performing H
2
O
2
decontamination, make sure that the outer and inner doors are securely
closed . During H
2
O
2
decontamination, plug the access hole with the silicon caps that are provided. Failure
to do so may be harmful to health due to leakage of H
2
O
2
gas.
WARNING
Never start H
2
O
2
decontamination when “Warning: UV Bulb Life” is displayed in the message display field.
The UV resolve is not sufficient.
CAUTION
H
2
O
2
decontamination can be performed only for the chamber and inner attachments with standard
specifications, and not for any other objects.
CAUTION
Perform H
2
O
2
decontamination with the inner attachments arranged as specified by our company .
Arranging them in a different way may result in insufficient decontamination.
CAUTION
Wear rubber gloves when handling the H
2
O
2
reagent . Direct contact with the H
2
O
2
reagent may result in
inflammation of the skin.
CAUTION
After H
2
O
2
decontamination has been completed, residual H
2
O
2
solution will remain on the bottom of the
chamber, the H
2
O
2
vapor generator, and the bottom of the duct. Wearing protective glasses and rubber
gloves, wipe it off with a non-woven cloth . Failure to do so may result in a deficient culture.