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FILMETRICS F54 Скачать руководство пользователя страница 19

Baseline warning

Software issues a warning in case 
of important intensity difference
after new baseline
This can be due to

•

Lamp state (off or burnt, not 
warmed-up)

•

Objective used for last baseline

Acknowledge if it makes sense!

Содержание F54

Страница 1: ...Filmetrics F54 Thin Film Mapping Analyzer User Manual...

Страница 2: ...WARNINGS DO NOT TOUCH BEND THE FIBERS KEEP HANDS AWAY high speed stage...

Страница 3: ...WARNINGS DO NOT TOUCH SCRATCH stage reference background mirror AVOID SAMPLE CRASH Measurement objectives...

Страница 4: ...Turn the light source on Tool usually always ON...

Страница 5: ...Start the FILMapper software Stage initializes without warnings KEEP HANDS AWAY...

Страница 6: ...Move the stage to Load position RISK OF DAMAGING THE OPTICS Do not load with stage under the objective...

Страница 7: ...Sample loading good practice OK stage at 0 100 NO EXCHANGE UNDER OBJECTIVE...

Страница 8: ...Choose a Recipe and Edit it From Wafer Map tab From Measurement tab Under Thickness n k r...

Страница 9: ...Pick a Recipe CMi folder standard recipes DO NOT MODIFY Users folder custom recipes...

Страница 10: ...Define the stack Film Stack tab Choose the units m nm Define substrate film s medium Input expected thickness nominal range tick to measure enable fit Move to Analysis Options...

Страница 11: ...alysis Options Limit the Wavelength Range if appropriate Adjust moving average Smoothing to denoise the spectrum use 1000um to disable Change Method to Exact for stacks and or thickness 150nm Move to...

Страница 12: ...ify measurement configuration sample size number of points exclusion OK to limit autofocus in center for the sake of speed Move to Acquisition Settings Advanced options including Deskew under Wafer Ma...

Страница 13: ...nable disable Autofocus Available methods are Goodness Of Fit Max of reflectometer signal and Image based focus Save As to create a new recipe DO NOT OVERWRITE CMi ones Acquire a Baseline optional and...

Страница 14: ...Objective and Baseline Select the objective matching the current configuration IMPORTANT Optional take a Baseline measurement lamp warm up time 5min...

Страница 15: ...Objectives 5x red ring spot size 50 m 15x violet ring spot size 17 m...

Страница 16: ...e standard Si 4 Acquire reference standard reflectance 5 Let the machine acquire the background 45 mirror and align the stage 6 Unload reference standard and load your sample To move the stage when pr...

Страница 17: ...2 on Si Filmetrics calibration sample 1 Sample reflectance calibration region go to 30 0 2 Reference reflectance calibration region go to 0 0 3 patterned sample region One Si wafer available for refer...

Страница 18: ...Baseline steps 1 Sample reflectance your wafer 2 Reflectance standard Si wafer...

Страница 19: ...ning Software issues a warning in case of important intensity difference after new baseline This can be due to Lamp state off or burnt not warmed up Objective used for last baseline Acknowledge if it...

Страница 20: ...Point measurements Navigate to the point of interest by means of camera and r theta controls arrows or Go To button wafer center 0 0 Clic Measure Check goodness of fit GOF...

Страница 21: ...Measurement summary History tab Basic statistics available in realtime on all stored data Purge history Export to text spreadsheet...

Страница 22: ...Wafer Mapping Click on Start Interacting with the map Left click go to point Right click mark as invalid interpolate from neighbours...

Страница 23: ...Turn lamp off when done...

Страница 24: ...nge 20nm 40um Accuracy 2nm or 0 2 Precision 0 2nm Stability 0 05nm Wavelength range 380 1050nm Spot size 250um aperture 50um 5x 17um 15x on request 500um aperture 100um 5x 33um 15x Typical speed 5 poi...

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