Veeco Dimension 3100, Manual, Page: 112 / 376

Cantilever Preparation
Silicon Cantilever Substrates
92 Dimension 3100 Manual Rev. D
Figure 6.1d Silicon Probe Tip Step Profile Artifact (Side-to-Side)
Measurements of line pitch are often best measured using the side-to-side faces of the tip, which
exhibits symmetry. Because of the approximate 17° half angle of the tip, the line or space
measurement is best done at the top of the line for simplification of the measurement artifacts (see
Figure 6.1e ).
Figure 6.1e Common Silicon Probe Profile (Resultant Scan Artifact)
Figure 6.1e depicts the resultant effect of the angled back ridge on the step angle measurement for a
deeper trench depth. This is tip and topography dependent.
Scan Line Profile
1 - 2 µm Deep Trench
73° 73°
Note: Any wall angle that is > 73 deg.
will be shown as 73 deg. in the image.
Scan line produced using
theoretical tip shape on a 1-2µm
deep vertical wall trench
Scan direction = 90 degrees
Scan Line Profile
55°
70 - 80°
10°
1 µm - 2 µm Deep Trench
Note: Any wall angle on the left wall that is > 55 deg.
will be shown as 55 deg. in the image.
Any wall angle on the right wall that is >70-80 deg.
will be shown as 70 -> 80 deg. in the image.
Subsequent scan line produced
using the realistic tip shape