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System Manual
Oxford Instruments Plasma Technology
OpAL
3.7.3
Lower chamber configuration for plasma and thermal ALD
The lower chamber configuration for plasma and thermal ALD is shown in Fig 3-25
(based on drawing MA71A29232).
Lower chamber
liner
Heater
cartridge
Lower process
chamber
O ring
O ring
Adapter flange
(pumping line)
Thermocouple
leg
Heater
legs
Water in
for flange
cooling
Water out
for flange
cooling
Mounting
flange
Thermo
Switch
Fig 3-25: Lower chamber configuration for both thermal and plasma ALD
Description
Printed: 07 August 2009 07:42
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Issue 1: August 07
Summary of Contents for OpAL
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