KODAK PROFESSIONAL Technical Pan Film
•
P-255
11
0.58
0.64
0.48
0.70
Index
Contrast
25
20
16
25
Exposure
Index
11
9
7
5
Time (min)
Developing
5 min =0.50
11 min =0.70
7 min =0.60
9 min =0.65
Process:
Exposure:
Developer 5, 7, 9, and 11 minutes at
Small tank, KODAK TECHNIDOL Liquid
Daylight, 1/25 second
68 F (20 C), agitation at 30-second intervals
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0
1.0
F002_0193AC
0.50
DEVELOPMENT TIME
0.40
7
(minutes)
11
5
9
CONTRAST
0.70
0.60
INDEX
10 min =2.00
12 min =2.50
6 min =1.20
8 min =1.50
Process:
Exposure:
6, 8, 10, and 12 minutes at 68 F (20 C),
Small tank, KODAK Developer D-76;
Tungsten, 1/25 second
agitation at 30-second intervals
F002_0186AC
INDEX
EXPOSURE
INDEX
CONTRAST
125
100
12
10
50
75
8
6
GAMMA
1.00
1.25
1.50
1.75
2.00
DEVELOPMENT TIME
(minutes)
1.0
0.0
1.0
4.0
3.0
2.0
1.0
DENSITY
2.0
0.0
3.0
LOG EXPOSURE (lux-seconds)
DENSITY
KODAK VERSAMAT Film Processor,
Daylight, 1/25 second
KODAK VERSAMAT 641 Chemicals at
5, 10, 15, 20, and 25 ft/min at 85 F (29.4 C);
Exposure:
Process:
5 fpm =2.90
10 fpm =1.55
15 fpm =1.30
20 fpm =1.05
25 fpm =0.85
Model 11; 1 developer rack
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0
1.0
(fpm)
MACHINE SPEED
2.20
1.80
1.40
1.00
0.60
5 10
100
50
15 20
150
200
CONTRAST
INDEX
EXPOSURE
INDEX
25
F002_0191AC
Model 11; 1 developer rack
25 fpm =1.35
20 fpm =1.60
15 fpm =2.20
10 fpm =2.80
5 fpm =3.60
Process:
Exposure:
Chemicals at 85 F (29.4 C); KODAK
KODAK VERSAMAT 885
Daylight, 1/25 second
VERSAMAT Film Processor,
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0
1.0
(fpm)
MACHINE SPEED
2.60
2.20
1.80
1.40
1.00
5 10
150
100
15 20
200
250
CONTRAST
INDEX
EXPOSURE
INDEX
25
F002_0190AC
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0
1.0
(fpm)
MACHINE SPEED
2.20
1.80
1.40
1.00
0.60
5 10
100
50
15 20
150
200
CONTRAST
INDEX
EXPOSURE
INDEX
F002_0192AC
KODAK VERSAMAT Film Processor,
Daylight, 1/25 second
KODAK DURAFLO RT Developer at
5, 10, 15, and 20 ft/min at 85 F (29.4 C);
Exposure:
Process:
5 fpm =2.40
10 fpm =1.60
15 fpm =1.00
20 fpm =0.80
Model 11; 2 developer racks
