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FILMETRICS F54, User Manual, Page: 10 / 24

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FILMETRICS F54 User Manual Download Page 10

Define the stack (Film Stack tab)

•

Choose the units (µm, nm, Å)

•

Define
substrate/film(s)/medium

•

Input expected thickness
(nominal ± range),
tick to measure (enable fit)

•

-> Move to Analysis Options 

Summary of Contents for F54

Page 1: ...Filmetrics F54 Thin Film Mapping Analyzer User Manual...

Page 2: ...WARNINGS DO NOT TOUCH BEND THE FIBERS KEEP HANDS AWAY high speed stage...

Page 3: ...WARNINGS DO NOT TOUCH SCRATCH stage reference background mirror AVOID SAMPLE CRASH Measurement objectives...

Page 4: ...Turn the light source on Tool usually always ON...

Page 5: ...Start the FILMapper software Stage initializes without warnings KEEP HANDS AWAY...

Page 6: ...Move the stage to Load position RISK OF DAMAGING THE OPTICS Do not load with stage under the objective...

Page 7: ...Sample loading good practice OK stage at 0 100 NO EXCHANGE UNDER OBJECTIVE...

Page 8: ...Choose a Recipe and Edit it From Wafer Map tab From Measurement tab Under Thickness n k r...

Page 9: ...Pick a Recipe CMi folder standard recipes DO NOT MODIFY Users folder custom recipes...

Page 10: ...Define the stack Film Stack tab Choose the units m nm Define substrate film s medium Input expected thickness nominal range tick to measure enable fit Move to Analysis Options...

Page 11: ...alysis Options Limit the Wavelength Range if appropriate Adjust moving average Smoothing to denoise the spectrum use 1000um to disable Change Method to Exact for stacks and or thickness 150nm Move to...

Page 12: ...ify measurement configuration sample size number of points exclusion OK to limit autofocus in center for the sake of speed Move to Acquisition Settings Advanced options including Deskew under Wafer Ma...

Page 13: ...nable disable Autofocus Available methods are Goodness Of Fit Max of reflectometer signal and Image based focus Save As to create a new recipe DO NOT OVERWRITE CMi ones Acquire a Baseline optional and...

Page 14: ...Objective and Baseline Select the objective matching the current configuration IMPORTANT Optional take a Baseline measurement lamp warm up time 5min...

Page 15: ...Objectives 5x red ring spot size 50 m 15x violet ring spot size 17 m...

Page 16: ...e standard Si 4 Acquire reference standard reflectance 5 Let the machine acquire the background 45 mirror and align the stage 6 Unload reference standard and load your sample To move the stage when pr...

Page 17: ...2 on Si Filmetrics calibration sample 1 Sample reflectance calibration region go to 30 0 2 Reference reflectance calibration region go to 0 0 3 patterned sample region One Si wafer available for refer...

Page 18: ...Baseline steps 1 Sample reflectance your wafer 2 Reflectance standard Si wafer...

Page 19: ...ning Software issues a warning in case of important intensity difference after new baseline This can be due to Lamp state off or burnt not warmed up Objective used for last baseline Acknowledge if it...

Page 20: ...Point measurements Navigate to the point of interest by means of camera and r theta controls arrows or Go To button wafer center 0 0 Clic Measure Check goodness of fit GOF...

Page 21: ...Measurement summary History tab Basic statistics available in realtime on all stored data Purge history Export to text spreadsheet...

Page 22: ...Wafer Mapping Click on Start Interacting with the map Left click go to point Right click mark as invalid interpolate from neighbours...

Page 23: ...Turn lamp off when done...

Page 24: ...nge 20nm 40um Accuracy 2nm or 0 2 Precision 0 2nm Stability 0 05nm Wavelength range 380 1050nm Spot size 250um aperture 50um 5x 17um 15x on request 500um aperture 100um 5x 33um 15x Typical speed 5 poi...

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