Rigaku MFM65S2RFFFLFL, Инструкция по эксплуатации

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56
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ME12058B
Operation Section
(2) When reflection occurs only on the surface
10
-5
10
-4
10
-3
10
-2
10
-1
10
0
Re
fl
ec
ti
v
it
y
6 5 4 3 2 1 0
2 θ/θ (degree)
(3) When the reflected waves from the surface and interface interfere with each other
' sin
1
2 ' sin 2
θ
θ
n
d d
−
+ ⋅ = ∆
θ
’
θ
d
10
-4
10
-3
10
-2
10
-1
10
0
R
ef
lecti
v
it
y
6 5 4 3 2 1 0
2 θ/θ (degree)
⊿
(4) Interpretation of the XRR profile
10
-5
10
-4
10
-3
10
-2
10
-1
10
0
Re
fl
e
ct
iv
it
y
8 6 4 2 0
2
θ/θ
(degree)
Attenuation rate of intensity at
large angles
↓
Surface roughness
σ
Attenuation rate of oscillation at
large angles
↓
Roughness
σ
of surface/interface
Interval
∆θ
of oscillation
↓
Film thickness d
Amplitude of oscillation
↓
Density contrast
Critical angle
θ
c
↓
Density
ρ
Density
ρ
1
Density
ρ
2
Density
ρ
3
Film thickness d1
Film thickness d2
Roughness
σ
1
Roughness
σ
2
Roughness
σ
3
Fig. A1-1-3 Surface Reflection
Fig. A1-1-4 Thickness Oscillation
Fig. A1-1-5 XRR Profile