Q150T Sample Preparation System
Q150T - Instruction Manual
83
10473 - Issue 5
Table 29
Aperture Cleaning profile parameters
Name
Default
Value
Minimum
Value
Maximum
Value
Comment
Evaporation
Current (A)
0
0
50**
Current applied to evaporation
source during the evaporation.
**If
Max Evaporation Voltage
parameter set below 2V the
maximum value will increase to
100A.
Evaporation time
(Minutes)
1
0.1
4
Duration of evaporation pulse.
Max Evaporation
Voltage(V)
20
1
20
Set the maximum voltage that
can be driven on to the source.
Tooling Factor
5
0.1
10
Tooling factor for this process
Pump hold
No
No
Yes
If
Yes,
Q150T pumps down to
outgas-ready state and waits for
user input.
Note:
If hold time (set in
System | Vacuum | Pump hold
time
– see page 46) is
exceeded, Q150T vents
chamber.
Flush chamber
No
No
Yes
Set to
Yes
to flush chamber
with nitrogen before pumping
down.
Table 30
Vacuum shutdown properties
Name
Default
Value
Minimum
Value
Maximum
Value
Comment
Shut down
Vacuum (mBar)
1
1x10-2
1x10+2
Set the Vacuum that the system
will pump down to.
Note the final vacuum may be
different.
9.2
System Overrideable Parameters
If you have Admin group privileges, you can override some of the parameters normally
determined by the selected profile.
Table 31
System override properties
Name
Overridden System property
Description
Gas bleed time
System>Generic Sputter> Gas bleed
time
Time Ar allowed to flow into
chamber before plasma started
Bleed Vacuum
System>Generic Sputter> Bleed
Vacuum
Pressure at which the chamber
is maintained at while the
plasma is present
Clean current
System>Generic Sputter> Clean
current
Current at which the target is
cleaned at.
Clean time
System>Generic Sputter> Clean time
Time for which the target is
cleaned for
Stage rotate
System>Hardware>Stage Rotate
Allow the stage to be turned off
for just this cycle
Stage Speed
System>Hardware>Stage Speed
Set the speed of the stage for
this process
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