Genie Nano-CL C2450, Руководство пользователя

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Operational Reference Genie Nano-CL Series™
The image below shows a “dark” capture with Fast Readout Mode enabled and analog gain set to
maximum. The artifacts will become visible as fixed pattern DN column variations near the left
edge of the video frame. There are darker columns followed by lighter columns as marked by the
overlay graphics. These DN variations are not random columns, but consistent between individual
OnSemi sensors operating in Fast Readout mode with high gain.
Fast Readout Mode Artifacts Correction
As noted in this section, the Fast Readout mode artifacts are automatically corrected by the factory
default enabled Flat Field correction.
Alternatively for maximum acquisition quality, disable Fast Readout Mode to eliminate
acquisition DN variances, at a small reduction of the maximum frame rate. Also remember that
high gain settings will increase overall sensor noise therefore additional gain should be used only
when necessary.
Exposure Alignment: Overview
Exposure Control modes define the method and timing of controlling the sensor integration period.
The integration period is the amount of time the sensor is exposed to incoming light before the
video frame data is transmitted to the controlling computer.
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Exposure control is defined as the start of exposure and exposure duration.
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The feature Exposure Mode selects the controlling method for the exposure.
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The start of exposure is initiated by an internal timer signal, an external input trigger signal
(Trigger Mode=ON), or a software function call.
• The exposure duration can be programmable (Exposure Mode = Timed, free run or external
trigger) or controlled by the external input trigger pulse width (Exposure Mode = TriggerWidth).
Note that different Nano models will support different combinations of exposure controls.
See also
Trigger Overlap: Feature Details .