System Options:
Plasma Cleaner
9-55
SAMPLE CLEANING PROCEDURE
1.
Move the stage to the lowest Z-axis position.
2.
Run the
Tools
menu /
Sample Cleaning…
procedure.
When the procedure is entered from the vented state, the system
pupms to the HiVac mode automatically. When the procedure is
finished or aborted by the user, the system remains in the HiVac
mode.
During the procedure run, stage moves are disabled temporarily.
3.
Place the sample back to the observation position.
4.
Pump to any vacuum mode desired for observation.
5.
In case the above described method gives unsatisfactory results
vent the chamber and place the sample holder with samples to be
cleaned on the bottom pumping hole grid, pump the chamber and
follow from the step No. 2 on.
FIGURE 9-47
SAMPLE CLEANING POSITION
The plasma Cleaner must be used in the HiVac mode only. When
entering the procedure and some conditions are not allowed, the
dialog or tooltip appears onscreen.
Warning!
If EDS / WDS / EBSD system is mounted, use 1 mm collimator on
EDS detector and do not exceed 5 minutes overall procedure duration
once a day at most.
Always retract EDS detector before plasma cleaning!
Avoid leaving sensitive carbon containing samples (e.g. photo resist)
inside the chamber during Plasma Cleaning procedure, as they may
be etched by the cleaning process.
Any material that can create or release oxide easily (e.g. silver)
should not be plasma cleaned (Au-C resolution tests samples could
be left inside the chamber during the Sample Cleaning procedure).
Содержание Quanta FEG 250
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