FEI Scios 2, User'S Operation Manual

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Maintenance : Stage
C O N F I D E N T I A L – FEI Limited Rights Data 6-6
Stage
Stage Mechanics
Checking the condition of the stage should be a weekly exercise as many different samples may be exchanged in
this time period. Some samples may be powders or composite materials that inadvertently drop particles on or in
the stage. If a silicon wafer breaks in the chamber it can shatter into hundreds of pieces. In this case the stage
should be thoroughly cleaned before attempting movement again.
Cleaning Stage Parts
Abrasive and solvents must not be used on the moving stage parts. Cleaning by a suction is the ideal method. If not
available, cleaning should be done by using dry nitrogen gas bursts around the stage mechanics to blow out any
foreign materials. Make sure the final lens and detectors are protected from the turbulence. Do not use sharp metal
objects to scrape away debris. A fine pair of plastic tweezers can be used to pick up difficult particles. Spillage on
the stage should be wiped up using a lint-free cloth, followed by suction or blowing with clean gaseous nitrogen.
Specimen Holders
Recommended cleaning procedures are given below for parts which operate in vacuum and which are subject to
possible contamination. Frequency of cleaning is, in most cases, determined by necessity (image quality or
astigmatism level).
Cleaning
1. Clean these parts using a lint free cloth and a mild abrasive according to the List of applied cleaners (see above).
2. Rinse in tap water.
3. Clean in an ultrasonic cleaner for 5 minutes using distilled water.
4. Clean in an ultrasonic cleaner for 5 minutes using alcohol p/a or isopropanol.
C a u t i o n !

Do not place parts together in the beakers. Wash separately as damage can occur to the metal surfaces.
5. Rinse in alcohol p/a.
6. First blow dry with a compressed air canister, then dry thoroughly under an infra-red lamp (15 min to 1 hr) at a
temperature between 80 °C and 100 °C. Do not bake in an oven!