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CONFIDENTIAL
AIXTRON
- Dokumentation
Use, data
System Manual
Introduction
CRIUS II
1
1.1
Introduction
1.1.1
Validity of this System Manual
Document identification: System Manual, crius_II_en_00, Edition 06/2010
This System Manual describes the CRIUS II.
You find the project number on the type label of your system.
This System Manual may show or describe components which are not part of
the AIXTRON scope of delivery. Such information is intended for better under-
standing. However, AIXTRON excludes any liability for such components and
the corresponding information.
1.1.2
Intended use of the CRIUS II
The CRIUS II is intended for epitaxial deposition of materials on wafers using
CVD technology. (CVD = chemical vapor deposition).
To guarantee that the system is run in accordance with the binding stipula-
tions, you must:
•
Be qualified for working with the CRIUS II
•
Read and observe the information contained in this System Manual
•
Adhere to the technical data
•
Perform maintenance work punctually
1.1.3
Other uses and applications
Written permission from AIXTRON AG (AIXTRON) is required for uses other
than those stipulated above. Any use beyond the applications described
above will be regarded as not conforming to provisions. AIXTRON declines all
liability for damages which occur when stipulations are disregarded.
